Laser cleaning technology is a revolutionary advancement in cleaning methods, offering high energy density, precision, and efficient laser conduction. It has clear advantages over traditional cleaning techniques, enhancing cleaning efficiency, accuracy, and targeting specific areas. Moreover, laser cleaning avoids the environmental pollution caused by chemical cleaning processes and does not damage the underlying material.Even so, laser marker We must also adhere to the quality of the industry and create unique products for the company. http://laserscheme.com/
Principle of Laser Cleaning
What is Laser Cleaning?
Laser cleaning is the process of removing materials from solid (or sometimes liquid) surfaces by irradiating them with a laser beam.
Low laser flux: The material absorbs laser energy and evaporates or sublimates.
High laser flux: The material converts into plasma.
Most laser cleaning uses pulsed lasers, but continuous wave lasers can also ablate materials. Factors like laser wavelength, pulse length, and material properties affect the ablation rate, while laser scanning speed and coverage further influence the process.
Types of Laser Cleaning Technology
Laser Dry Cleaning:
Pulsed laser irradiates the surface, causing either the contaminants or the substrate to absorb energy and expand, resulting in separation.
Laser Wet Cleaning:
A liquid film is applied to the surface. When irradiated by the laser, the liquid vaporizes, generating a shock wave that removes contaminants.
Laser Plasma Shock Wave Cleaning:
Laser irradiation generates a plasma shock wave, which releases energy that removes contaminants without damaging the substrate. This method cleans particles as small as nanometers.
Physical Principles of Plasma Cleaning
Absorption: The contamination layer absorbs laser energy.
Plasma Formation: A rapidly expanding plasma generates shock waves.
Contaminant Removal: Shock waves break contaminants into fragments.
Controlled Energy: Laser pulse width must prevent heat accumulation to avoid surface damage.
Applications of Laser Cleaning Technology
Semiconductor Field
Used for cleaning semiconductor wafers and optical substrates, laser wet cleaning and laser plasma shock wave cleaning are commonly applied to remove particulate pollutants without damaging the substrate.
Metal Material Field
Laser cleaning is highly effective in removing oxides, rust, paint, and coatings from metal surfaces. Applications include pre-welding cleaning and aircraft skin maintenance. The process is efficient, non-damaging, and has seen wide use in various industries.
Development and Expansion of Laser Cleaning Technology
Laser cleaning technology has advanced significantly, with applications now in aerospace, military, and electronics fields. The technology has been maturely applied in paint and rust removal, and recent innovations have enabled cleaning oxide layers from metal wires. With continued development, laser cleaning will likely expand into new fields, and fully automated systems could be achieved by integrating with industrial robots.
Future Trends in Laser Cleaning Technology
Strengthening Theoretical Research:
Further research is needed to establish a comprehensive theoretical system to guide laser cleaning applications.
Expanding Applications:
The expansion of laser cleaning into new fields will drive its development, supported by innovations in equipment.
Development of New Equipment:
New laser cleaning systems will feature both versatile and specialized designs. The integration of industrial robots is a key trend in fully automated laser cleaning.